ISO 22415:2019

Indisponible en français

Publiée (Edition 1, 2019)

ISO 22415:2019

CHF 151

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Résumé

This document specifies a method for measuring and reporting argon cluster sputtering yield volumes of a specific organic material. The method requires one or more test samples of the specified material as a thin, uniform film of known thickness between 50 and 1 000 nanometres on a flat substrate which has a different chemical composition to the specified material. This document is applicable to test samples in which the specified material layer has homogeneous composition in depth and is not applicable if the depth distribution of compounds in the specified material is inhomogeneous. This document is applicable to instruments in which the sputtering ion beam irradiates the sample using a raster to ensure a constant ion dose over the analysis area.

Informations générales

État actuel
: Publiée

Date de publication
: 2019-05

Stade
: Norme internationale en cours d'examen systématique [90.20]
Edition
: 1
Comité technique :
ISO/TC 201/SC 6

ICS :
71.040.40
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