Abstract

 Preview

This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.


General information 

  • Status
     :  Published
    Publication date
     : 2019-06
  • Edition
     : 1
    Number of pages
     : 4
  • Technical Committee
     : ISO/TC 206 Fine ceramics
  • ICS
     :
    81.060.30 Advanced ceramics

Sustainable Development Goals

This standard contributes to the following Sustainable Development Goal:

9
Industry, Innovation and Infrastructure

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